Chemical processing from the gas phase is a vital tool in materials science research and plays a key role in nanotechnology.
Two important methods of such processing are Chemical Vapour Deposition (CVD) and Atomic Layer Deposition (ALD). The latest developments regarding these techniques were discussed at the EuroCVD 22 - Baltic ALD 16 Conference, which was held at the Luxexpo exhibition and congress centre on June 24-28, 2019. The conference is one of the most important ones in the realm of process and materials development. The 2019 edition focused on processes that are performed under atmospheric pressure, low vacuum, and ultra-high vacuum, and also processes that are assisted with plasma, plasmon, and light. The conference was chaired by Naoufal Bahlawane of LIST. The Grand Duchy was an ideal location for the event, explained attendee Ruud van Ommen from the Delft University of Technology, saying that these days,
‘Luxembourg is focusing so much on the development of novel materials and materials research’.
